Invention Grant
US08698402B2 Pulsed electron source, power supply method for pulsed electron source and method for controlling a pulsed electron source 有权
脉冲电子源,脉冲电源的电源方法和脉冲电子源的控制方法

  • Patent Title: Pulsed electron source, power supply method for pulsed electron source and method for controlling a pulsed electron source
  • Patent Title (中): 脉冲电子源,脉冲电源的电源方法和脉冲电子源的控制方法
  • Application No.: US12812270
    Application Date: 2009-01-08
  • Publication No.: US08698402B2
    Publication Date: 2014-04-15
  • Inventor: Maxime Makarov
  • Applicant: Maxime Makarov
  • Applicant Address: BE Antwerp
  • Assignee: Excico Group
  • Current Assignee: Excico Group
  • Current Assignee Address: BE Antwerp
  • Agency: Young & Thompson
  • Priority: FR0800165 20080111
  • International Application: PCT/FR2009/000018 WO 20090108
  • International Announcement: WO2009/106759 WO 20090903
  • Main IPC: H01J7/24
  • IPC: H01J7/24
Pulsed electron source, power supply method for pulsed electron source and method for controlling a pulsed electron source
Abstract:
The invention relates to a pumped electron source (1) that includes an ionization chamber (4), an acceleration chamber (2) with an electrode (3) for extracting and accelerating primary ions and forming a secondary-electron beam, characterized in that the pumped electron source (1) includes a power supply (11) adapted for applying to the electrode (3) a positive voltage for urging a primary plasma (17) outside the acceleration chamber (2), and a negative voltage pulse for extracting and accelerating the primary ions and forming a secondary-electron beam.
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