Invention Grant
- Patent Title: Pulsed electron source, power supply method for pulsed electron source and method for controlling a pulsed electron source
- Patent Title (中): 脉冲电子源,脉冲电源的电源方法和脉冲电子源的控制方法
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Application No.: US12812270Application Date: 2009-01-08
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Publication No.: US08698402B2Publication Date: 2014-04-15
- Inventor: Maxime Makarov
- Applicant: Maxime Makarov
- Applicant Address: BE Antwerp
- Assignee: Excico Group
- Current Assignee: Excico Group
- Current Assignee Address: BE Antwerp
- Agency: Young & Thompson
- Priority: FR0800165 20080111
- International Application: PCT/FR2009/000018 WO 20090108
- International Announcement: WO2009/106759 WO 20090903
- Main IPC: H01J7/24
- IPC: H01J7/24

Abstract:
The invention relates to a pumped electron source (1) that includes an ionization chamber (4), an acceleration chamber (2) with an electrode (3) for extracting and accelerating primary ions and forming a secondary-electron beam, characterized in that the pumped electron source (1) includes a power supply (11) adapted for applying to the electrode (3) a positive voltage for urging a primary plasma (17) outside the acceleration chamber (2), and a negative voltage pulse for extracting and accelerating the primary ions and forming a secondary-electron beam.
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