Invention Grant
- Patent Title: Method for determining illumination source with optimized depth of focus
- Patent Title (中): 用优化焦深确定照明光源的方法
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Application No.: US13154450Application Date: 2011-06-07
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Publication No.: US08699003B2Publication Date: 2014-04-15
- Inventor: Chun-Wei Wu
- Applicant: Chun-Wei Wu
- Applicant Address: TW Kueishan, Tao-Yuan Hsien
- Assignee: Nanya Technology Corp.
- Current Assignee: Nanya Technology Corp.
- Current Assignee Address: TW Kueishan, Tao-Yuan Hsien
- Agent Winston Hsu; Scott Margo
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/52 ; G03B27/54 ; G03B27/68

Abstract:
A method for determining an illumination source with optimized depth of focus includes the following steps. First, a simulated optimal correlation and a simulated defocus correlation of each illumination source are provided. Second, an optimal peak is determined, a defocus peak is determined, and an optimal correlation slope and a defocus correlation slope are determined. An optimal correlation ratio and a peak variation are calculated. A correlation variation is calculated from the optimal correlation ratio and the defocus correlation ratio. Next, a weighted variation is determined from the peak variation and the correlation variation. An illumination source of a lowest weighted variation among a plurality of the illumination sources is determined to be an illumination source with optimized depth of focus.
Public/Granted literature
- US20120314195A1 METHOD FOR DETERMINING ILLUMINATION SOURCE WITH OPTIMIZED DEPTH OF FOCUS Public/Granted day:2012-12-13
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