Invention Grant
- Patent Title: Reflectivity measuring device, reflectivity measuring method, membrane thickness measuring device, and membrane thickness measuring method
- Patent Title (中): 反射率测量装置,反射率测量方法,膜厚测量装置和膜厚测量方法
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Application No.: US13822741Application Date: 2011-09-14
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Publication No.: US08699023B2Publication Date: 2014-04-15
- Inventor: Kenichi Ohtsuka , Tetsuhisa Nakano
- Applicant: Kenichi Ohtsuka , Tetsuhisa Nakano
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: Hamamatsu Photonics K.K.
- Current Assignee: Hamamatsu Photonics K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2010-209668 20100917
- International Application: PCT/JP2011/071020 WO 20110914
- International Announcement: WO2012/036213 WO 20120322
- Main IPC: G01J3/28
- IPC: G01J3/28

Abstract:
A reflectivity measuring device 1 includes a measurement light source 30 that supplies irradiation light L1 to a measurement object, a spectroscopic detection unit 80 that detects, at multi-wavelength, intensity of the irradiation light L1 and intensity of reflected light L2 from the measurement object, a coefficient recording unit 92 that records a conversion coefficient K(λ) for converting a detected value of each wavelength's intensity of the irradiation light L1 into a value corresponding to a detected value of each wavelength's intensity of reflected light L2 from a reference measurement object, and a reflectivity calculation unit 93 that calculates each wavelength's reflectivity based on the value corresponding to the each wavelength's intensity of the reflected light L2 from the reference measurement object obtained from the detected value of the each wavelength's intensity of the irradiation light L1 and the conversion coefficient K(λ).
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