Invention Grant
- Patent Title: Substrate metallization and ball attach metallurgy with a novel dopant element
- Patent Title (中): 基底金属化和球附着冶金与新型掺杂元素
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Application No.: US12641237Application Date: 2009-12-17
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Publication No.: US08701281B2Publication Date: 2014-04-22
- Inventor: Rajen S. Sidhu , Ashay A. Dani , Mukul P. Renavikar
- Applicant: Rajen S. Sidhu , Ashay A. Dani , Mukul P. Renavikar
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Main IPC: H05K3/00
- IPC: H05K3/00 ; H05K3/34 ; H05K1/03 ; H05K1/00 ; H05K1/16 ; H05K7/10

Abstract:
Surface-active dopants are added to a portion of a circuit package before a reflow process to promote wetting and reduce the formation of solder bump bridges. The circuit package has a solder element that electrically connects the circuit package to a substrate. A reflow process is performed to attach the solder element to a pad on the circuit package. During the reflow process, the surface-active dopants diffuse to the surface of the solder element and form an oxide passivation layer on the surface of the solder element.
Public/Granted literature
- US20110147066A1 SUBSTRATE METALLIZATION AND BALL ATTACH METALLURGY WITH A NOVEL DOPANT ELEMENT Public/Granted day:2011-06-23
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