Invention Grant
- Patent Title: Reconfigurable lithographic structures
- Patent Title (中): 可重构光刻结构
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Application No.: US12864942Application Date: 2009-03-06
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Publication No.: US08703073B2Publication Date: 2014-04-22
- Inventor: David Hugo Gracias , Timothy Gar-Ming Leong
- Applicant: David Hugo Gracias , Timothy Gar-Ming Leong
- Applicant Address: US MD Baltimore
- Assignee: The Johns Hopkins University
- Current Assignee: The Johns Hopkins University
- Current Assignee Address: US MD Baltimore
- Agency: Venable LLP
- Agent Henry J. Daley; F. Brock Riggs
- International Application: PCT/US2009/036391 WO 20090306
- International Announcement: WO2009/111737 WO 20090911
- Main IPC: G01N15/06
- IPC: G01N15/06

Abstract:
A lithographically structured device has an actuation layer and a control layer operatively connected to the actuation layer. The actuation layer includes a stress layer and a neutral layer that is constructed of materials and with a structure such that it stores torsional energy upon being constructed. The control layer is constructed to maintain the actuation layer substantially in a first configuration in a local environmental condition and is responsive to a change in the local environmental condition such that it permits a release of stored torsional energy to cause a change in a structural configuration of the lithographically structured device to a second configuration, the control layer thereby providing a trigger mechanism. The lithographically structured device has a maximum dimension that is less than about 10 mm when it is in the second configuration.
Public/Granted literature
- US20100326071A1 RECONFIGURABLE LITHOGRAPHIC STRUCTURES Public/Granted day:2010-12-30
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