Invention Grant
- Patent Title: Methods of manufacturing large-area sputtering targets by cold spray
- Patent Title (中): 通过冷喷制造大面积溅射靶的方法
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Application No.: US13628089Application Date: 2012-09-27
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Publication No.: US08703233B2Publication Date: 2014-04-22
- Inventor: Steven A. Miller , Francois-Charles Dary , Mark Gaydos , Gary Rozak
- Applicant: H.C. Starck, Inc.
- Applicant Address: US MA Newton
- Assignee: H.C. Starck Inc.
- Current Assignee: H.C. Starck Inc.
- Current Assignee Address: US MA Newton
- Agency: Bingham McCutchen LLP
- Main IPC: B05D1/02
- IPC: B05D1/02 ; B05D1/38
Abstract:
In various embodiments, a joined sputtering target is formed by filling at least a portion of a gap between two discrete sputtering-target tiles with a gap-fill material, spray-depositing a spray material to form a partial joint, removing at least a portion of the gap-fill material, and, thereafter, spray-depositing the spray material to join the tiles.
Public/Granted literature
- US20130081748A1 METHODS OF MANUFACTURING LARGE-AREA SPUTTERING TARGETS BY COLD SPRAY Public/Granted day:2013-04-04
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