Invention Grant
US08703386B2 Metal peroxo compounds with organic co-ligands for electron beam, deep UV and extreme UV photoresist applications
有权
金属过氧化合物与电子束,深UV和极紫外光致抗蚀剂应用的有机共配体
- Patent Title: Metal peroxo compounds with organic co-ligands for electron beam, deep UV and extreme UV photoresist applications
- Patent Title (中): 金属过氧化合物与电子束,深UV和极紫外光致抗蚀剂应用的有机共配体
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Application No.: US13405587Application Date: 2012-02-27
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Publication No.: US08703386B2Publication Date: 2014-04-22
- Inventor: John David Bass , Ho-Cheol Kim , Robert Dennis Miller , Qing Song , Linda Karin Sundberg , Gregory Michael Wallraff
- Applicant: John David Bass , Ho-Cheol Kim , Robert Dennis Miller , Qing Song , Linda Karin Sundberg , Gregory Michael Wallraff
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Michael R. Roberts
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004 ; G03F7/029 ; C07C49/92 ; C07C7/00

Abstract:
Compositions are disclosed having the formula (3): [C′]k[Ta(O2)x(L′)y] (3), wherein x is an integer of 1 to 4, y is an integer of 1 to 4, Ta(O2)x(L′)y has a charge of 0 to −3, C′ is a counterion having a charge of +1 to +3, k is an integer of 0 to 3, L′ is an oxidatively stable organic ligand having a charge of 0 to −4, and L′ comprises an electron donating functional group selected from the group consisting of carboxylates, alkoxides, amines, amine oxides, phosphines, phosphine oxides, arsine oxides, and combinations thereof. The compositions have utility as high resolution photoresists.
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