Invention Grant
- Patent Title: Transistors comprising a SiC-containing channel
- Patent Title (中): 晶体管包括含SiC通道
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Application No.: US13901719Application Date: 2013-05-24
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Publication No.: US08703566B2Publication Date: 2014-04-22
- Inventor: Chandra Mouli
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John, P.S.
- Main IPC: H01L21/336
- IPC: H01L21/336

Abstract:
A memory device includes an array of memory cells and peripheral devices. At least some of the individual memory cells include carbonated portions that contain SiC. At least some of the peripheral devices do not include any carbonated portions. A transistor includes a first source/drain, a second source/drain, a channel including a carbonated portion of a semiconductive substrate that contains SiC between the first and second sources/drains and a gate operationally associated with opposing sides of the channel.
Public/Granted literature
- US20130248885A1 Transistors Comprising a SiC-Containing Channel Public/Granted day:2013-09-26
Information query
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