Invention Grant
- Patent Title: High-voltage integrated circuit device
- Patent Title (中): 高压集成电路器件
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Application No.: US13515546Application Date: 2011-09-12
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Publication No.: US08704328B2Publication Date: 2014-04-22
- Inventor: Masaharu Yamaji
- Applicant: Masaharu Yamaji
- Applicant Address: JP
- Assignee: Fuji Electric Co., Ltd.
- Current Assignee: Fuji Electric Co., Ltd.
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell, LLP
- Priority: JP2011-140137 20110624
- International Application: PCT/JP2011/070760 WO 20110912
- International Announcement: WO2012/176347 WO 20121227
- Main IPC: H01L23/48
- IPC: H01L23/48

Abstract:
A high-voltage integrated circuit device has formed therein a high-voltage junction terminating region that is configured by a breakdown voltage region formed of an n-well region, a ground potential region formed of a p-region, a first contact region and a second contact region. An opposition section of the high-voltage junction terminating region, whose distance to an intermediate-potential region formed of a p-drain region is shorter than those of other sections, is provided with a resistance higher than those of the other sections. Accordingly, a cathode resistance of a parasitic diode formed of the p-region and the n-well region increases, locally reducing the amount of electron holes injected at the time of the input of a negative-voltage surge. As a result, an erroneous operation or destruction of a logic part of a high-side circuit can be prevented when the negative-voltage surge is applied to an H-VDD terminal or a Vs terminal.
Public/Granted literature
- US20130001736A1 HIGH-VOLTAGE INTEGRATED CIRCUIT DEVICE Public/Granted day:2013-01-03
Information query
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