Invention Grant
- Patent Title: Optical defect amplification for improved sensitivity on patterned layers
- Patent Title (中): 光学缺陷放大，提高图案层的灵敏度
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Application No.: US13384330Application Date: 2010-07-15
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Publication No.: US08705027B2Publication Date: 2014-04-22
- Inventor: Steven R. Lange , Stephane Durant , Gregory L. Kirk , Robert M. Danen , Prashant Aji
- Applicant: Steven R. Lange , Stephane Durant , Gregory L. Kirk , Robert M. Danen , Prashant Aji
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- International Application: PCT/US2010/042148 WO 20100715
- International Announcement: WO2011/008964 WO 20110120
- Main IPC: G01N21/00
- IPC: G01N21/00
Abstract:
A method for wafer defect inspection may include, but is not limited to: providing an inspection target; applying at least one defect inspection enhancement to the inspection target; illuminating the inspection target including the at least one inspection enhancement to generate one or more inspection signals associated with one or more features of the inspection target; detecting the inspection signals; and generating one or more inspection parameters from the inspection signals. An inspection target may include, but is not limited to: at least one inspection layer; and at least one inspection enhancement layer.
Public/Granted literature
- US20120113416A1 OPTICAL DEFECT AMPLIFICATION FOR IMPROVED SENSITIVITY ON PATTERNED LAYERS Public/Granted day:2012-05-10
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