Invention Grant
- Patent Title: Electrodes and their fabrication methods as well as applications
- Patent Title (中): 电极及其制造方法以及应用
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Application No.: US13424457Application Date: 2012-03-20
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Publication No.: US08709105B2Publication Date: 2014-04-29
- Inventor: Chuen-Chang Lin , Jhang-Hao Jhan
- Applicant: Chuen-Chang Lin , Jhang-Hao Jhan
- Applicant Address: TW Douliou
- Assignee: National Yunlin University of Science & Technology
- Current Assignee: National Yunlin University of Science & Technology
- Current Assignee Address: TW Douliou
- Agency: Fishman & Associates, LLC
- Main IPC: H01G9/00
- IPC: H01G9/00

Abstract:
An electrode including a substrate and a complex metal oxide film deposited on the surface of the substrate. The complex metal oxide film includes manganese oxide, cobalt oxide, and zinc oxide. A main component of the complex metal oxide film is manganese oxide. The stability of the electrode is enhanced by adding little amount of cobalt oxide and zinc oxide. Furthermore, a method relates to fabricate the electrode. The method utilizes a dry process, simpler one-step radio frequency magnetron sputtering to fabricate the electrode of the present invention. The process can reduce residual impurities in the electrode and then prevent the electrochemical capacitor and cell from explosion. Moreover, an electrochemical capacitor and a cell relates to of the above electrode.
Public/Granted literature
- US20130250483A1 Electrodes And Their Fabrication Methods As Well As Applications Public/Granted day:2013-09-26
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