Invention Grant
- Patent Title: Method of preparing scintillation materials with reduced afterglow
- Patent Title (中): 减少余辉制备闪烁材料的方法
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Application No.: US13962997Application Date: 2013-08-09
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Publication No.: US08709155B1Publication Date: 2014-04-29
- Inventor: Charles Brecher , Vivek Nagarkar
- Applicant: Charles Brecher , Vivek Nagarkar
- Applicant Address: US MA Boston
- Assignee: Alexander Lempicki
- Current Assignee: Alexander Lempicki
- Current Assignee Address: US MA Boston
- Agency: Burns & Levinson LLP
- Agent Jacob N. Erlich; Orlando Lopez
- Main IPC: C30B29/06
- IPC: C30B29/06

Abstract:
Scintillation materials of this invention have an alkali halide host material, a (first) scintillation dopant of various types, and a variety of second dopants (co-dopants). In another embodiment, the scintillation materials of this invention have an alkali halide host material, a (first) scintillation dopant of various types, a variety of second dopants (co-dopants), and a variety of third dopants (co-dopants). Co-dopants of this invention are capable of providing a second auxiliary luminescent cation dopant, capable of introducing an anion size and electronegativity mismatch, capable of introducing a mismatch of anion charge, or introducing a mismatch of cation charge in the host material.
Information query
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