Invention Grant
- Patent Title: Vertical heat treatment apparatus
- Patent Title (中): 立式热处理设备
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Application No.: US12170477Application Date: 2008-07-10
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Publication No.: US08709159B2Publication Date: 2014-04-29
- Inventor: Nobuyuki Okamura
- Applicant: Nobuyuki Okamura
- Applicant Address: JP Tokyo
- Assignee: Ricoh Company, Ltd.
- Current Assignee: Ricoh Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Dickstein Shapiro LLP
- Priority: JP2007-212076 20070816
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23F1/00 ; H01L21/306

Abstract:
A vertical heat treatment apparatus enabling the insertion of a temperature sensor in the reaction tube without disassembling the apparatus is disclosed. The vertical heat treatment apparatus includes a reaction tube; a heating section; a wafer holding section; a supporting section movably provided in the vertical direction so as to seal the reaction tube while the wafer holding section is in the reaction tube; a temperature sensor insertion section provided in the supporting section and having a through hole for guiding a temperature sensor so that the temperature sensor can be inserted into the reaction tube; and a cap section for opening and closing the through hole of the temperature sensor insertion section while the wafer holding section is on the supporting section.
Public/Granted literature
- US20090044746A1 VERTICAL HEAT TREATMENT APPARATUS Public/Granted day:2009-02-19
Information query
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