Invention Grant
US08709698B2 Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography
有权
用于正型光刻的共聚物，用于制备所述共聚物的聚合引发剂和用于半导体光刻的组合物
- Patent Title: Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography
- Patent Title (中): 用于正型光刻的共聚物，用于制备所述共聚物的聚合引发剂和用于半导体光刻的组合物
-
Application No.: US13199907Application Date: 2011-09-12
-
Publication No.: US08709698B2Publication Date: 2014-04-29
- Inventor: Minoru Iijima , Takanori Yamagishi
- Applicant: Minoru Iijima , Takanori Yamagishi
- Applicant Address: JP Tokyo
- Assignee: Maruzen Petrochemical Co., Ltd.
- Current Assignee: Maruzen Petrochemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Ware, Fressola, Maguire & Barber LLP
- Priority: JP2006/138768 20060518
- Main IPC: G03F7/00
- IPC: G03F7/00 ; C09B31/16
Abstract:
A radical polymerization initiator represented by the following formula (G) in the formula (G), R71 and R72 are each a hydrocarbon group of 3 to 6 carbon atoms which may contain nitrogen atom; R73 and R74 are each a hydrogen atom or an acid-dissociating, dissolution-suppressing group; and at least one of R73 and R74 is an acid-dissociating, dissolution-suppressing group represented by the following formula (R78); and wherein R77 is a hydrocarbon group of 1 to 26 carbon atoms which may contain hetero atoms.
Public/Granted literature
Information query
