A method for fabricating a flash memory device where the flash memory device includes a substantially uniform size and spatial distribution of nanoparticles on a tunnel oxide layer to form a floating gate. The flash memory device may be fabricated by defining active areas in a substrate and forming an oxide layer on the substrate. A self-assembled protein lattice may be formed on top of the oxide layer where the self-assembled protein lattice includes a plurality of molecular chaperones. The cavities of the chaperones may provide confined spaces where nanocrystals can be trapped thereby forming an ordered nanocrystal lattice. A substantially uniform distribution of nanocrystals may be formed on the oxide layer upon removal of the self-assembled protein lattice such as through high temperature annealing.