Invention Grant
- Patent Title: Solid-state imaging device and method for manufacturing the same
- Patent Title (中): 固态成像装置及其制造方法
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Application No.: US13428024Application Date: 2012-03-23
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Publication No.: US08711258B2Publication Date: 2014-04-29
- Inventor: Masayuki Takase , Motonari Katsuno , Tetsuya Nakamura
- Applicant: Masayuki Takase , Motonari Katsuno , Tetsuya Nakamura
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Panasonic Patent Center
- Priority: JP2011-096168 20110422
- Main IPC: H04N3/14
- IPC: H04N3/14 ; H04N5/225 ; H01L31/062 ; H01L27/00

Abstract:
A solid-state imaging device includes a semiconductor substrate having a plurality of light-receiving portions (PD) formed therein, a wiring layer formed on the semiconductor substrate, color filters formed on the wiring layer in a manner individually corresponding to the light-receiving portions (PD) of the semiconductor substrate, and partition walls each formed between the individual color filters. Each of the partition walls includes a lower layer portion and an upper layer portion, an upper surface of the lower layer portion is modified into a modified layer, and an interface for facilitating reflection of penetration light from outside is structured between the modified layer and the upper layer portion.
Public/Granted literature
- US20120268631A1 SOLID-STATE IMAGING DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2012-10-25
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