Invention Grant
- Patent Title: Method and system for determining a suppression factor of a suppression system and a lithographic apparatus
- Patent Title (中): 用于确定抑制系统和光刻设备的抑制因子的方法和系统
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Application No.: US12742009Application Date: 2008-11-06
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Publication No.: US08711325B2Publication Date: 2014-04-29
- Inventor: Hendrikus Gijsbertus Schimmel , Tjarko Adriaan Rudolf Van Empel , Hans Johannes Maria Freriks , Yuri Johannes Gabriël Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Marc Antonius Maria Haast , Wendelin Johanna Maria Versteeg , Peter Gerardus Jonkers , Dzmitry Labetski
- Applicant: Hendrikus Gijsbertus Schimmel , Tjarko Adriaan Rudolf Van Empel , Hans Johannes Maria Freriks , Yuri Johannes Gabriël Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Marc Antonius Maria Haast , Wendelin Johanna Maria Versteeg , Peter Gerardus Jonkers , Dzmitry Labetski
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/NL2008/050700 WO 20081106
- International Announcement: WO2009/061188 WO 20090514
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.
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