Invention Grant
- Patent Title: Pre-colored methodology of multiple patterning
- Patent Title (中): 多色图案的预色方法
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Application No.: US13607946Application Date: 2012-09-10
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Publication No.: US08713491B2Publication Date: 2014-04-29
- Inventor: Yen-Huei Chen , Hung-Jen Liao , Jonathan Tsung-Yung Chang
- Applicant: Yen-Huei Chen , Hung-Jen Liao , Jonathan Tsung-Yung Chang
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Associates, LLC
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
Some embodiments relate to a method of pre-coloring word lines and control lines within an SRAM integrated chip design to avoid timing delays that result from processing variations introduced through multiple patterning lithography processes. The method is performed by generating a graphical IC layout file having an SRAM circuit with a plurality of word lines and Y-control lines. The word lines and Y-control lines are assigned a color during decomposition. The word lines and Y-control lines are further pre-colored in a manner that deliberately assigns the pre-colored data to a same mask. Therefore, during mask building, data associated with pre-colored word and Y-control lines is sent to a same mask, regardless of the colors that are assigned to the data. By assigning word and Y-control lines to a same mask through pre-coloring, processing variations between the word and Y-control lines are minimized, thereby mitigating timing variations in an SRAM circuit.
Public/Granted literature
- US20130263066A1 Pre-Colored Methodology of Multiple Patterning Public/Granted day:2013-10-03
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