Invention Grant
- Patent Title: Tuning Tzc by the annealing of ultra low expansion glass
- Patent Title (中): 通过超低膨胀玻璃的退火调整Tzc
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Application No.: US12868934Application Date: 2010-08-26
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Publication No.: US08713969B2Publication Date: 2014-05-06
- Inventor: Carlos Duran , Kenneth Edward Hrdina
- Applicant: Carlos Duran , Kenneth Edward Hrdina
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Walter M. Douglas
- Main IPC: C03B25/00
- IPC: C03B25/00

Abstract:
The disclosure describes a method by which the Tzc of a silica-titania glass article, for example, a EUVL mirror substrate, can be tuned to within a specification range by means of a selected final anneal that shifts Tzc of the article or substrate to the desired Tzc value. In addition, since different mirrors in a set can be specified at different values of Tzc, this process can be on used glass samples or pieces from a single glass boule to make parts with different Tzc values, thus reducing the number of separate boules required to fill an order.
Public/Granted literature
- US20110048075A1 TUNING Tzc BY THE ANNEALING OF ULTRA LOW EXPANSION GLASS Public/Granted day:2011-03-03
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