Invention Grant
US08713988B2 Use of gas void fraction measurement is the closed loop control of a fermentation process 有权
气体空隙率测量的使用是发酵过程的闭环控制

  • Patent Title: Use of gas void fraction measurement is the closed loop control of a fermentation process
  • Patent Title (中): 气体空隙率测量的使用是发酵过程的闭环控制
  • Application No.: US13148715
    Application Date: 2010-02-16
  • Publication No.: US08713988B2
    Publication Date: 2014-05-06
  • Inventor: John Biesak
  • Applicant: John Biesak
  • Applicant Address: US CT Wallingford
  • Assignee: CiDRA Corporate Services Inc.
  • Current Assignee: CiDRA Corporate Services Inc.
  • Current Assignee Address: US CT Wallingford
  • International Application: PCT/US2010/024255 WO 20100216
  • International Announcement: WO2010/094018 WO 20100819
  • Main IPC: G01N29/024
  • IPC: G01N29/024
Use of gas void fraction measurement is the closed loop control of a fermentation process
Abstract:
A technique related to a fermentation process; where a signal processor receives a signal containing information about an amount of entrained air in a mixture forming part of a fermentation process in a tank; and determines a level of foam in the tank based at least partly on the amount of entrained air in the mixture. The signal processor may also provide a control signal for controlling an amount of defoamer (or antiforming agent) added to the mixture in the tank so as to control the production of foam within the tank by controlling the amount of defoamer added to the mixture in the tank.
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