Invention Grant
- Patent Title: Laser-irradiated thin films having variable thickness
- Patent Title (中): 具有可变厚度的激光照射薄膜
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Application No.: US13740664Application Date: 2013-01-14
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Publication No.: US08715412B2Publication Date: 2014-05-06
- Inventor: James S. Im
- Applicant: The Trustees of Columbia University in the City of New York
- Applicant Address: US NY New York
- Assignee: The Trustees of Columbia University in the City of New York
- Current Assignee: The Trustees of Columbia University in the City of New York
- Current Assignee Address: US NY New York
- Agency: Wilmer, Cutler, Pickering, Hale and Dorr LLP
- Main IPC: C30B1/00
- IPC: C30B1/00 ; C30B3/00 ; C30B5/00 ; C30B28/02

Abstract:
Systems for processing thin films having variable thickness are provided. A crystalline film includes a first crystalline region having a first film thickness and a first crystalline grain structure; and a second crystalline region having a second film thickness and a second crystalline grain structure. The first film thickness is greater than the second film thickness and the first and second film thicknesses are selected to provide a crystalline region having the degree and orientation of crystallization that is desired for a device component.
Public/Granted literature
- US20130161312A1 LASER-IRRADIATED THIN FILMS HAVING VARIABLE THICKNESS Public/Granted day:2013-06-27
Information query
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