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US08715412B2 Laser-irradiated thin films having variable thickness 失效
具有可变厚度的激光照射薄膜

Laser-irradiated thin films having variable thickness
Abstract:
Systems for processing thin films having variable thickness are provided. A crystalline film includes a first crystalline region having a first film thickness and a first crystalline grain structure; and a second crystalline region having a second film thickness and a second crystalline grain structure. The first film thickness is greater than the second film thickness and the first and second film thicknesses are selected to provide a crystalline region having the degree and orientation of crystallization that is desired for a device component.
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