Invention Grant
- Patent Title: Apparatus and method for electroplating
- Patent Title (中): 电镀设备及方法
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Application No.: US13330181Application Date: 2011-12-19
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Publication No.: US08715481B2Publication Date: 2014-05-06
- Inventor: Hiroo Otsuka
- Applicant: Hiroo Otsuka
- Applicant Address: JP
- Assignee: Otsuka Kinzoku Kabushiki Kaisha
- Current Assignee: Otsuka Kinzoku Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Merek, Blackmon & Voorhees, LLC
- Priority: JP2011-038199 20110224
- Main IPC: C25D5/02
- IPC: C25D5/02 ; B23H11/00

Abstract:
A processed product is continuously partially plated without being covered. Electroplating is carried out on a portion other than a head of a processed product also having a lower part and a constricted part between the head and the lower part. A pair of rails has an opening between the rails narrower than the head and broader than the constricted part, and electrodes are arranged thereon. A plating bath is positioned below the rails, and electrode plates are arranged in a plating solution. The constricted part of the processed product is positioned at the opening between the rails, and a pushing element extending from above the rails through the opening contacts the processed product at a position lower than the center of gravity at the lower part. The pushing element is displaced along the rails to plate a portion of the processed products positioned below the rails.
Public/Granted literature
- US20120217164A1 Apparatus and Method for Electroplating Public/Granted day:2012-08-30
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