Invention Grant
US08715519B2 Plasma reactor with adjustable plasma electrodes and associated methods
有权
具有可调等离子体电极的等离子体反应器及相关方法
- Patent Title: Plasma reactor with adjustable plasma electrodes and associated methods
- Patent Title (中): 具有可调等离子体电极的等离子体反应器及相关方法
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Application No.: US13774772Application Date: 2013-02-22
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Publication No.: US08715519B2Publication Date: 2014-05-06
- Inventor: Daniel Harrington
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Perkins Coie LLP
- Main IPC: G01L21/30
- IPC: G01L21/30 ; G01R31/00
Abstract:
Plasma reactors with adjustable plasma electrodes and associated methods of operation are disclosed herein. The plasma reactors can include a chamber, a workpiece support for holding a microfeature workpiece, and a plasma electrode in the chamber and spaced apart from the workpiece support. The plasma electrode has a first portion and a second portion configured to move relative to the first portion. The first and second portions are configured to electrically generate a plasma between the workpiece support and the plasma electrode.
Public/Granted literature
- US20130164941A1 PLASMA REACTOR WITH ADJUSTABLE PLASMA ELECTRODES AND ASSOCIATED METHODS Public/Granted day:2013-06-27
Information query
