Invention Grant
US08715903B2 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same
有权
光敏性或辐射敏感性树脂组合物，以及使用其的抗蚀剂膜和图案形成方法
- Patent Title: Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same
- Patent Title (中): 光敏性或辐射敏感性树脂组合物，以及使用其的抗蚀剂膜和图案形成方法
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Application No.: US13117293Application Date: 2011-05-27
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Publication No.: US08715903B2Publication Date: 2014-05-06
- Inventor: Hisamitsu Tomeba , Akinori Shibuya
- Applicant: Hisamitsu Tomeba , Akinori Shibuya
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2010-126352 20100601
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004
Abstract:
An actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a fluorine-containing compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein the acid has a polarity converting group, and the fluorine content of the fluorine-containing compound (A) is 20% or more based on the molecular weight of the fluorine-containing compound (A).
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