Invention Grant
- Patent Title: Photocurable composition
- Patent Title (中): 可光固化组合物
-
Application No.: US13457657Application Date: 2012-04-27
-
Publication No.: US08715904B2Publication Date: 2014-05-06
- Inventor: Zai-Ming Qiu , Douglas C. Fall
- Applicant: Zai-Ming Qiu , Douglas C. Fall
- Applicant Address: US MN St. Paul
- Assignee: 3M Innovative Properties Company
- Current Assignee: 3M Innovative Properties Company
- Current Assignee Address: US MN St. Paul
- Agent Kent S. Kokko
- Main IPC: G03F7/004
- IPC: G03F7/004
Abstract:
A low surface energy photoresist composition is described that comprises a silicone-polyether block copolymer, wherein the silicone block comprises 35 wt. % or more of said copolymer. When compounded with a photoresist composition, the composition enables the release of a phototool from the photoresist layer.
Public/Granted literature
- US20130288162A1 PHOTOCURABLE COMPOSITION Public/Granted day:2013-10-31
Information query
IPC分类:
