Invention Grant
- Patent Title: Coating composition for DUV filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method
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Application No.: US13188670Application Date: 2011-07-22
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Publication No.: US08715911B2Publication Date: 2014-05-06
- Inventor: Hyun-woo Kim , Hai-sub Na , Chil-hee Chung , Han-ku Cho
- Applicant: Hyun-woo Kim , Hai-sub Na , Chil-hee Chung , Han-ku Cho
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2010-0071605 20100723
- Main IPC: G06F7/26
- IPC: G06F7/26
Abstract:
Provided are a coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the coating composition including about 100 parts by weight of a solvent including a first solvent (the first solvent being an alcoholic solvent); and about 0.05 parts by weight to about 5 parts by weight of a coating polymer having a degree of absorption of about 50%/μm or greater with respect to 193-nm incident light.
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