Invention Grant
- Patent Title: Microelectronic workpiece processing systems and associated methods of color correction
- Patent Title (中): 微电子工件加工系统及相关方法的颜色校正
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Application No.: US12715820Application Date: 2010-03-02
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Publication No.: US08716038B2Publication Date: 2014-05-06
- Inventor: Kevin Tetz , Charles M. Watkins
- Applicant: Kevin Tetz , Charles M. Watkins
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Perkins Coie LLP
- Main IPC: H01L21/66
- IPC: H01L21/66

Abstract:
Several embodiments of semiconductor systems and associated methods of color corrections are disclosed herein. In one embodiment, a method for producing a light emitting diode (LED) includes forming an (LED) on a substrate, measuring a base emission characteristic of the formed LED, and selecting a phosphor based on the measured base emission characteristic of the formed LED such that a combined emission from the LED and the phosphor at least approximates white light. The method further includes introducing the selected phosphor onto the LED via, for example, inkjet printing.
Public/Granted literature
- US20110217794A1 MICROELECTRONIC WORKPIECE PROCESSING SYSTEMS AND ASSOCIATED METHODS OF COLOR CORRECTION Public/Granted day:2011-09-08
Information query
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