Invention Grant
US08716079B2 Superior fill conditions in a replacement gate approach by corner rounding based on a sacrificial fill material
有权
基于牺牲填充材料，通过拐角加工在替代浇口处理中具有优异的填充条件
- Patent Title: Superior fill conditions in a replacement gate approach by corner rounding based on a sacrificial fill material
- Patent Title (中): 基于牺牲填充材料，通过拐角加工在替代浇口处理中具有优异的填充条件
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Application No.: US12891403Application Date: 2010-09-27
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Publication No.: US08716079B2Publication Date: 2014-05-06
- Inventor: Jens Heinrich , Fernando Koch , Johann Steinmetz
- Applicant: Jens Heinrich , Fernando Koch , Johann Steinmetz
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Amerson Law Firm, PLLC
- Priority: DE102009047890 20090930
- Main IPC: H01L21/8238
- IPC: H01L21/8238
Abstract:
In a replacement gate approach, a top area of a gate opening may receive a superior cross-sectional shape on the basis of a material erosion process, wherein a sacrificial material may protect sensitive materials, such as a high-k dielectric material, in the gate opening. In one illustrative embodiment, the sacrificial material may be applied after depositing a work function adjusting species in the gate opening.
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