Invention Grant
- Patent Title: Material for cleaning a substrate
- Patent Title (中): 用于清洁基材的材料
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Application No.: US12948613Application Date: 2010-11-17
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Publication No.: US08716210B2Publication Date: 2014-05-06
- Inventor: Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker
- Applicant: Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Martine Penilla Group, LLP
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C11D11/00 ; C11D17/00
Abstract:
Material for cleaning using a tri-state body are disclosed. A substrate having a particle deposited thereon is provided. A tri-state body that has a solid portion, liquid portion, and a gas portion is generated. A force is applied over the tri-state body to promulgate an interaction between the solid portion and the particle. The tri-state body is removed along with the particle from the surface of the substrate. The interaction between the solid portion and the particle causes the particle to be removed along with the tri-state body.
Public/Granted literature
- US20110065621A1 MATERIAL FOR CLEANING A SUBSTRATE Public/Granted day:2011-03-17
Information query
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