Invention Grant
US08716385B2 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation
有权
可聚合的含氟单体，氟聚合物，抗蚀剂材料和图案形成方法
- Patent Title: Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation
- Patent Title (中): 可聚合的含氟单体，氟聚合物，抗蚀剂材料和图案形成方法
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Application No.: US13139665Application Date: 2009-12-03
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Publication No.: US08716385B2Publication Date: 2014-05-06
- Inventor: Haruhiko Komoriya , Shinichi Sumida , Kenjin Inomiya , Takashi Mori , Takamasa Kitamoto , Yusuke Kanto
- Applicant: Haruhiko Komoriya , Shinichi Sumida , Kenjin Inomiya , Takashi Mori , Takamasa Kitamoto , Yusuke Kanto
- Applicant Address: JP Ube-shi
- Assignee: Central Glass Company, Limited
- Current Assignee: Central Glass Company, Limited
- Current Assignee Address: JP Ube-shi
- Agency: Crowell & Moring LLP
- Priority: JP2008-319027 20081215
- International Application: PCT/JP2009/070319 WO 20091203
- International Announcement: WO2010/071029 WO 20100624
- Main IPC: C09D133/16
- IPC: C09D133/16
Abstract:
Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.
Public/Granted literature
- US20110244188A1 Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation Public/Granted day:2011-10-06
Information query
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