Invention Grant
- Patent Title: Photocurable composition
- Patent Title (中): 可光固化组合物
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Application No.: US13120457Application Date: 2009-06-12
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Publication No.: US08716413B2Publication Date: 2014-05-06
- Inventor: Kai Dudde , Sabine Pierau , Martin Roth
- Applicant: Kai Dudde , Sabine Pierau , Martin Roth
- Applicant Address: US TX The Woodlands
- Assignee: Huntsman Advanced Materials Americas LLC
- Current Assignee: Huntsman Advanced Materials Americas LLC
- Current Assignee Address: US TX The Woodlands
- Priority: EP08165135 20080925
- International Application: PCT/EP2009/057269 WO 20090612
- International Announcement: WO2010/034531 WO 20100401
- Main IPC: C08L63/00
- IPC: C08L63/00

Abstract:
A method for the preparation of a photocurable resin by a reaction comprising the following steps i) reacting a mixture of a novolak type epoxy resin (A) and a dicyclopentadiene-phenol glycidylether resin (B) with ii) an advancement component (C) containing at least 2 phenolic hydroxyl groups per molecule; iii) reacting with an unsaturated monocarboxylic acid (D); and iv) esterification of the unsaturated group containing resin obtained from the steps of i) to iii) with a polycarboxylic acid anhydride or a carboxylic acid anhydride (E) is disclosed.
Public/Granted literature
- US20110200950A1 PHOTOCURABLE COMPOSITION Public/Granted day:2011-08-18
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