Invention Grant
- Patent Title: Photoacid generating monomer and precursor thereof
- Patent Title (中): 光产酸单体及其前体
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Application No.: US13340088Application Date: 2011-12-29
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Publication No.: US08716518B2Publication Date: 2014-05-06
- Inventor: Suzanne M. Coley , David R. Wilson , Francis J. Timmers
- Applicant: Suzanne M. Coley , David R. Wilson , Francis J. Timmers
- Applicant Address: US MA Marlborough US MI Midland
- Assignee: Rohm and Haas Electronic Materials LLC,Dow Global Technologies LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC,Dow Global Technologies LLC
- Current Assignee Address: US MA Marlborough US MI Midland
- Agency: Cantor Colburn LLP
- Main IPC: C07C309/00
- IPC: C07C309/00

Abstract:
A monomer compound has the formula (I): where each R1, R2, and R3 is independently H, F, C1-10 alkyl, fluoro-substituted C1-10 alkyl, C1-10 cycloalkyl, or fluoro-substituted C1-10 cycloalkyl, provided that at least one of R1, R2, or R3 is F; n is an integer of from 1 to 10, A is a halogenated or non-halogenated C2-30 olefin-containing polymerizable group, and G+ is an organic or inorganic cation. The monomer is the reaction product of a sultone precursor and the oxyanion of a hydroxy-containing halogenated or non-halogenated C2-30 olefin-containing compound. A polymer includes the monomer of formula (I).
Public/Granted literature
- US20120172555A1 PHOTOACID GENERATING MONOMER AND PRECURSOR THEREOF Public/Granted day:2012-07-05
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