Invention Grant
- Patent Title: Boron nitride anti-reflection coatings and methods
- Patent Title (中): 氮化硼防反射涂层及方法
-
Application No.: US12410276Application Date: 2009-03-24
-
Publication No.: US08716595B2Publication Date: 2014-05-06
- Inventor: Nacer Badi , Alex Freundlich , Abdelhak Bensaoula , Andenet Alemu
- Applicant: Nacer Badi , Alex Freundlich , Abdelhak Bensaoula , Andenet Alemu
- Applicant Address: US TX Houston
- Assignee: The University of Houston
- Current Assignee: The University of Houston
- Current Assignee Address: US TX Houston
- Agency: Jackson Walker L.L.P.
- Agent Christopher J. Rourk
- Main IPC: H01L31/00
- IPC: H01L31/00

Abstract:
High performance photovoltaic devices are provided. Certain embodiments relate to the use of Boron-Nitride (BN) thin films as anti-reflection coating (ARC) material on Si and GaAs solar cells. A low and wide reflectance window covering a large energy range of the solar spectrum is available. For a large part of the useful solar spectrum, the index of refraction of the grown BN thin films remains constant at about 2.8. In another embodiment, a BN ARC is applied directly on ordinary window glass providing the device's mechanical strength.
Public/Granted literature
- US20090235981A1 BORON NITRIDE ANTI-REFLECTION COATINGS AND METHODS Public/Granted day:2009-09-24
Information query
IPC分类: