Invention Grant
US08716816B2 SOI-based CMUT device with buried electrodes 有权
具有埋置电极的基于SOI的CMUT器件

  • Patent Title: SOI-based CMUT device with buried electrodes
  • Patent Title (中): 具有埋置电极的基于SOI的CMUT器件
  • Application No.: US13272054
    Application Date: 2011-10-12
  • Publication No.: US08716816B2
    Publication Date: 2014-05-06
  • Inventor: Glen A Fitzpatrick
  • Applicant: Glen A Fitzpatrick
  • Applicant Address: CA Edmonton, Alberta
  • Assignee: Micralyne Inc.
  • Current Assignee: Micralyne Inc.
  • Current Assignee Address: CA Edmonton, Alberta
  • Agent Anthony R. Lambert
  • Main IPC: H01L29/84
  • IPC: H01L29/84
SOI-based CMUT device with buried electrodes
Abstract:
A multi-layer stacked micro-electro-mechanical (MEMS) device that acts as a capacitive micromachined ultrasonic transducer (CMUT) with a hermetically sealed device cavity formed by a wafer bonding process with semiconductor and insulator layers. The CMUT design uses a doped Si SOI and wafer bonding fabrication method, and is composed of semiconductor layers, insulator layers, and metal layers. Conventional doped silicon may be used for electrode layers. Other suitable semi-conductor materials such as silicon carbide may be used for the electrode layers. The insulator may be silicon oxide, silicon nitride or other suitable dielectric.
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