Invention Grant
- Patent Title: Bipolar transistor
- Patent Title (中): 双极晶体管
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Application No.: US13124873Application Date: 2009-10-16
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Publication No.: US08716835B2Publication Date: 2014-05-06
- Inventor: Yuji Ando , Hironobu Miyamoto , Tatsuo Nakayama , Yasuhiro Okamoto , Takashi Inoue , Kazuki Ota
- Applicant: Yuji Ando , Hironobu Miyamoto , Tatsuo Nakayama , Yasuhiro Okamoto , Takashi Inoue , Kazuki Ota
- Applicant Address: JP Kawasaki-shi, Kanagawa
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kawasaki-shi, Kanagawa
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2008-270884 20081021
- International Application: PCT/JP2009/067909 WO 20091016
- International Announcement: WO2010/047281 WO 20100429
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/737 ; H01L29/20

Abstract:
A bipolar transistor is provided with an emitter layer, a base layer and a collector layer. The emitter layer is formed above a substrate and is an n-type conductive layer including a first nitride semiconductor. The base layer is formed on the emitter layer and is a p-type conductive including a second nitride semiconductor. The collector layer is formed on the base layer and includes a third nitride semiconductor. The collector layer, the base layer and the emitter layer are formed such that a crystal growth direction to the substrate surface is parallel to a substrate direction of [000-1]. The third nitride semiconductor contains InycAlxcGa1-xc-ycN (0•xc•1, 0•yc•1, 0
Public/Granted literature
- US20110278586A1 BIPOLAR TRANSISTOR Public/Granted day:2011-11-17
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