Invention Grant
US08717533B2 Exposure apparatus, exposure method, and method for producing device
有权
曝光装置，曝光方法和制造装置的方法
- Patent Title: Exposure apparatus, exposure method, and method for producing device
- Patent Title (中): 曝光装置，曝光方法和制造装置的方法
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Application No.: US11802060Application Date: 2007-05-18
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Publication No.: US08717533B2Publication Date: 2014-05-06
- Inventor: Hiroyuki Nagasaka , Takeshi Okuyama
- Applicant: Hiroyuki Nagasaka , Takeshi Okuyama
- Applicant Address: JP Tokyo JP Yokohama-shi
- Assignee: Nikon Corporation,Nikon Engineering Co., Ltd.
- Current Assignee: Nikon Corporation,Nikon Engineering Co., Ltd.
- Current Assignee Address: JP Tokyo JP Yokohama-shi
- Agency: Oliff PLC
- Priority: JP2004-172569 20040610; JP2004-245260 20040825; JP2004-330582 20041115
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52
Abstract:
A lithographic projection projects a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate. The space is smaller in plan than the substrate. The apparatus includes a plate substantially parallel to the substrate to divide the space into two parts, the plate having an aperture to allow transmission of the pattern onto the substrate.
Public/Granted literature
- US20070222957A1 Exposure apparatus, exposure method, and method for producing device Public/Granted day:2007-09-27
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