Invention Grant
- Patent Title: Calculating a laser metric within a lithographic apparatus and method thereof
- Patent Title (中): 计算光刻设备内的激光度量及其方法
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Application No.: US13019365Application Date: 2011-02-02
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Publication No.: US08717540B2Publication Date: 2014-05-06
- Inventor: Carsten Andreas Köhler , Hans Van Der Laan , Frank Staals , Laurentius Cornelius De Winter , Herman Philip Godfried
- Applicant: Carsten Andreas Köhler , Hans Van Der Laan , Frank Staals , Laurentius Cornelius De Winter , Herman Philip Godfried
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/32
Abstract:
Embodiments of the invention related to lithographic apparatus and methods. A lithographic method comprises calculating a laser metric based on a spectrum of laser radiation emitted from a laser to a lithographic apparatus together with a representation of an aerial image of a pattern to be projected onto the substrate by the lithographic apparatus, and using the laser metric to modify operation of the laser or adjust the lithographic apparatus, and projecting the pattern onto the substrate.
Public/Granted literature
- US20110200922A1 Lithographic Apparatus and Method Public/Granted day:2011-08-18
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