Invention Grant
US08717543B2 Substrate holder, stage apparatus, and exposure apparatus with first support part provided in a suction space and second support part
有权
基板支架，平台装置和曝光装置，其具有设置在吸入空间和第二支撑部分中的第一支撑部分
- Patent Title: Substrate holder, stage apparatus, and exposure apparatus with first support part provided in a suction space and second support part
- Patent Title (中): 基板支架，平台装置和曝光装置，其具有设置在吸入空间和第二支撑部分中的第一支撑部分
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Application No.: US12656058Application Date: 2010-01-14
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Publication No.: US08717543B2Publication Date: 2014-05-06
- Inventor: Yuichi Shibazaki
- Applicant: Yuichi Shibazaki
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2004-253978 20040901
- Main IPC: G03B27/60
- IPC: G03B27/60
Abstract:
An object of the invention is to hold a substrate with satisfactory flatness, even at a circumferential edge part that surrounds a suction space. The invention is equipped with a circumferential edge part that surrounds a suction space, and a first support part that is provided in the suction space and that supports a substrate. Furthermore, the invention is equipped with a second support part that extends from the circumferential edge part to the first support part and that supports the substrate.
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