Invention Grant
US08717686B2 Optical system, optical apparatus and optical system manufacturing method
有权
光学系统,光学仪器和光学系统制造方法
- Patent Title: Optical system, optical apparatus and optical system manufacturing method
- Patent Title (中): 光学系统,光学仪器和光学系统制造方法
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Application No.: US13299524Application Date: 2011-11-18
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Publication No.: US08717686B2Publication Date: 2014-05-06
- Inventor: Hiroshi Yamamoto , Issei Tanaka
- Applicant: Hiroshi Yamamoto , Issei Tanaka
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2010-259967 20101122; JP2010-259968 20101122; JP2010-259969 20101122; JP2011-223412 20111007; JP2011-223413 20111007; JP2011-223414 20111007
- Main IPC: G02B13/04
- IPC: G02B13/04 ; G02B9/04

Abstract:
An optical system WL has, in order from an object, a first lens group G1 having negative refractive power and a second lens group G2 having positive refractive power, wherein the first lens group G1 is fixed and the second lens group G2 moves upon focusing from an object at infinity to an object at a finite distance, and the second lens group G2 is formed of a front group G2a located closer to the object than an aperture stop S disposed in the second lens group G2, and a rear group G2b located closer to an image than the aperture stop S.
Public/Granted literature
- US20120127594A1 OPTICAL SYSTEM, OPTICAL APPARATUS AND OPTICAL SYSTEM MANUFACTURING METHOD Public/Granted day:2012-05-24
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