Invention Grant
- Patent Title: Nitride semiconductor laser and epitaxial substrate
- Patent Title (中): 氮化物半导体激光器和外延衬底
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Application No.: US13366636Application Date: 2012-02-06
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Publication No.: US08718110B2Publication Date: 2014-05-06
- Inventor: Takashi Kyono , Yohei Enya , Takamichi Sumitomo , Yusuke Yoshizumi , Masaki Ueno , Katsunori Yanashima , Kunihiko Tasai , Hiroshi Nakajima
- Applicant: Takashi Kyono , Yohei Enya , Takamichi Sumitomo , Yusuke Yoshizumi , Masaki Ueno , Katsunori Yanashima , Kunihiko Tasai , Hiroshi Nakajima
- Applicant Address: JP Osaka-Shi JP Tokyo
- Assignee: Sumitomo Electric Industries, Ltd.,Sony Corporation
- Current Assignee: Sumitomo Electric Industries, Ltd.,Sony Corporation
- Current Assignee Address: JP Osaka-Shi JP Tokyo
- Agency: Venable LLP
- Agent Michael A. Sartori
- Priority: JPP2011-096443 20110422
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A nitride semiconductor laser includes an electrically conductive support substrate with a primary surface of a gallium nitride based semiconductor, an active layer provided above the primary surface, and a p-type cladding region provided above the primary surface. The primary surface is inclined relative to a reference plane perpendicular to a reference axis extending in a direction of the c-axis of the gallium nitride based semiconductor. The p-type cladding region includes first and second p-type Group III nitride semiconductor layers. The first p-type semiconductor layer comprises an InAlGaN layer including built-in anisotropic strain. The second p-type semiconductor layer comprises semiconductor different from material of the InAlGaN layer. The first nitride semiconductor layer is provided between the second p-type semiconductor layer and the active layer. The second p-type semiconductor layer has a resistivity lower than that of the first p-type semiconductor layer.
Public/Granted literature
- US20120269222A1 NITRIDE SEMICONDUCTOR LASER AND EPITAXIAL SUBSTRATE Public/Granted day:2012-10-25
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