Invention Grant
- Patent Title: Reticle defect inspection with systematic defect filter
- Patent Title (中): 带有系统缺陷过滤器的光罩缺陷检查
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Application No.: US13486253Application Date: 2012-06-01
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Publication No.: US08718353B2Publication Date: 2014-05-06
- Inventor: Bing Li , Weimin Ma , Joseph M. Blecher
- Applicant: Bing Li , Weimin Ma , Joseph M. Blecher
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Kwan & Olynick LLP
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
A stream of defect data is received from a reticle inspection system. The defect data identifies defects that were detected for a plurality of different portions of a reticle. Before reviewing the defect data to determine whether the reticle passes inspection and as the stream of defect data continues to be received, some of the defects are automatically grouped with other most recently one or more received defects so as to form groups of substantially matching defects. Before reviewing the defect data to determine whether the reticle passes inspection and after all of the defect data for the reticle is received, one or more of the groups of defects that have a number above a predetermined threshold are automatically filtered from the defect data so as to form filtered defect data. The filtered defect data may then be provided to a review station for determining whether the reticle passes.
Public/Granted literature
- US20130236084A1 RETICLE DEFECT INSPECTION WITH SYSTEMATIC DEFECT FILTER Public/Granted day:2013-09-12
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