Invention Grant
US08719757B2 Method to enhance double patterning routing efficiency 有权
增强双重图案布线效率的方法

Method to enhance double patterning routing efficiency
Abstract:
A method for enabling jogging functionality in circuit designs utilizing DPT without the need for difficult to implement tools such as stitch-aware routing tools is disclosed. Embodiments include: displaying a user interface for generating an IC having a plurality of masks for a single layer; causing, at least in part, a presentation in the user interface of a cell placement of the IC that includes a filler cell; and designating a portion of the filler cell as a routing zone, the routing zone being configured such that routes placed in the routing zone are decomposable with other routes placed outside the filler cell.
Public/Granted literature
Information query
Patent Agency Ranking
0/0