Invention Grant
- Patent Title: Method to enhance double patterning routing efficiency
- Patent Title (中): 增强双重图案布线效率的方法
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Application No.: US13603304Application Date: 2012-09-04
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Publication No.: US08719757B2Publication Date: 2014-05-06
- Inventor: Lei Yuan , Jongwook Kye
- Applicant: Lei Yuan , Jongwook Kye
- Applicant Address: KY Grand Cayman
- Assignee: GlobalFoundries Inc.
- Current Assignee: GlobalFoundries Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Ditthavong Mori & Steiner, P.C.
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A method for enabling jogging functionality in circuit designs utilizing DPT without the need for difficult to implement tools such as stitch-aware routing tools is disclosed. Embodiments include: displaying a user interface for generating an IC having a plurality of masks for a single layer; causing, at least in part, a presentation in the user interface of a cell placement of the IC that includes a filler cell; and designating a portion of the filler cell as a routing zone, the routing zone being configured such that routes placed in the routing zone are decomposable with other routes placed outside the filler cell.
Public/Granted literature
- US20140068543A1 METHOD TO ENHANCE DOUBLE PATTERNING ROUTING EFFICIENCY Public/Granted day:2014-03-06
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