Invention Grant
- Patent Title: Dual-pattern coloring technique for mask design
- Patent Title (中): 面罩设计的双色彩着色技术
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Application No.: US13797788Application Date: 2013-03-12
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Publication No.: US08719765B2Publication Date: 2014-05-06
- Inventor: Min Cao , Jeffrey Markham
- Applicant: Cadence Design Systems, Inc.
- Applicant Address: US CA San Jose
- Assignee: Cadence Design Systems, Inc.
- Current Assignee: Cadence Design Systems, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Kenyon & Kenyon LLP
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A hierarchical schematic design editor displays mask layers for each shape as mask specific colors and alerts a user to mask layer conflicts during the design and editing process. According to an embodiment, mask colors may be assigned at the time the shapes or geometries and cells are placed in a circuit design layout, or when a mask layer condition indicating that two or more shapes should be set to different mask layers is detected. In an embodiment, if the distance between two shapes is less than a predetermined threshold, those shapes may cause a mask layer condition. Shapes may be grouped to facilitate mask layer condition detection and mask layer assignment.
Public/Granted literature
- US20130191793A1 DUAL-PATTERN COLORING TECHNIQUE FOR MASK DESIGN Public/Granted day:2013-07-25
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