Invention Grant
- Patent Title: Rotary atomizing head type coating device
- Patent Title (中): 旋转雾化头型涂装装置
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Application No.: US12811127Application Date: 2009-05-21
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Publication No.: US08720796B2Publication Date: 2014-05-13
- Inventor: Yukio Yamada
- Applicant: Yukio Yamada
- Applicant Address: JP Tokyo
- Assignee: ABB K.K.
- Current Assignee: ABB K.K.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-156581 20080616
- International Application: PCT/JP2009/059353 WO 20090521
- International Announcement: WO2009/154056 WO 20091223
- Main IPC: B05B3/02
- IPC: B05B3/02

Abstract:
A rotation restricting mechanism is provided between a mounting shaft section of a rotational shaft and a mounting tube section of a rotary atomizing head. The rotation restricting mechanism includes a male spline member provided on the outer peripheral side of the mounting shaft section, and a female spline member provided on the inner peripheral side of the mounting tube section. By meshing engagement of the male spline member with the female spline member, the rotation restricting mechanism restricts rotational displacements of the rotary atomizing head relative to the rotational shaft.
Public/Granted literature
- US20100282865A1 ROTARY ATOMIZING HEAD TYPE COATING DEVICE Public/Granted day:2010-11-11
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