Invention Grant
- Patent Title: Showerhead support structure for improved gas flow
- Patent Title (中): 喷头支撑结构，用于改善气流
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Application No.: US13163241Application Date: 2011-06-17
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Publication No.: US08721791B2Publication Date: 2014-05-13
- Inventor: Robin L. Tiner , Soo Young Choi , Qunhua Wang , Jrjyan Jerry Chen
- Applicant: Robin L. Tiner , Soo Young Choi , Qunhua Wang , Jrjyan Jerry Chen
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: C23C16/455
- IPC: C23C16/455 ; H01J37/32
Abstract:
Embodiments of the present invention generally provide apparatus and methods for supporting a gas distribution showerhead in a processing chamber. In one embodiment, a gas distribution showerhead for a vacuum chamber is provided. The gas distribution showerhead comprises a body having a first side and a second side opposite the first side, and a plurality of gas passages formed through the body, the gas passages comprising a first bore formed in the first side that is fluidly coupled to a second bore formed in the second side by a restricting orifice, and a suspension feature formed in the first bore of at least one of the gas passages.
Public/Granted literature
- US20120027918A1 SHOWERHEAD SUPPORT STRUCTURE FOR IMPROVED GAS FLOW Public/Granted day:2012-02-02
Information query
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