Invention Grant
- Patent Title: Plating apparatus and plating method
- Patent Title (中): 电镀装置及电镀方法
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Application No.: US13307906Application Date: 2011-11-30
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Publication No.: US08721863B2Publication Date: 2014-05-13
- Inventor: Yasuaki Tachi , Shigeki Sawa , Toshiyuki Kasuga
- Applicant: Yasuaki Tachi , Shigeki Sawa , Toshiyuki Kasuga
- Applicant Address: JP Ogaki-shi
- Assignee: Ibiden Co., Ltd.
- Current Assignee: Ibiden Co., Ltd.
- Current Assignee Address: JP Ogaki-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-020922 20060130
- Main IPC: C25D5/00
- IPC: C25D5/00 ; C25D7/06 ; C25D17/00

Abstract:
A method for plating a belt substrate including conveying a belt substrate through a plating tank, contacting an immersed cathode power-supply device and/or an auxiliary cathode power-supply device with the belt substrate conveyed into the interior of the plating tank such that the belt substrate becomes a cathode, and electrically plating a surface of the belt substrate in the interior of the plating tank while the immersed cathode power-supply device and/or the auxiliary cathode power-supply device maintains cathode power-supply to the belt substrate conveyed into the interior portion of the plating tank. The immersed cathode power-supply device and the auxiliary cathode power-supply device are positioned in the interior portion of the plating tank and are electrically connected by a short circuit wiring.
Public/Granted literature
- US20120073977A1 PLATING APPARATUS AND PLATING METHOD Public/Granted day:2012-03-29
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