Invention Grant
US08721952B2 Pneumatic method and apparatus for nano imprint lithography having a conforming mask
有权
具有适形掩模的纳米压印光刻的气动方法和装置
- Patent Title: Pneumatic method and apparatus for nano imprint lithography having a conforming mask
- Patent Title (中): 具有适形掩模的纳米压印光刻的气动方法和装置
-
Application No.: US10989078Application Date: 2004-11-16
-
Publication No.: US08721952B2Publication Date: 2014-05-13
- Inventor: Matthew E. Colburn , Yves C. Martin , Theodore G. van Kessel , Hematha K. Wickramasinghe
- Applicant: Matthew E. Colburn , Yves C. Martin , Theodore G. van Kessel , Hematha K. Wickramasinghe
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: McGinn IP Law Group, PLLC
- Agent Daniel P. Morris
- Main IPC: B29C59/02
- IPC: B29C59/02
Abstract:
A method (and apparatus) for nano lithography, includes applying a pneumatic pressure to at least one of a surface of a semi-rigid mask or template and a portion of a surface of a resist-coated workpiece, and, by the applying of the pneumatic pressure, transferring a pattern from the mask to the workpiece.
Public/Granted literature
- US20060105571A1 Pneumatic method and apparatus for nano imprint lithography Public/Granted day:2006-05-18
Information query
