The present invention discloses an integrated circuit (IC) comprising a bond pad (160); a substrate stack carrying a first layer (130) comprising conductive regions (135); and an interconnect layer (140) over the first layer (130) comprising a dielectric material portion (400) between the bond pad (160) and the substrate stack, said portion comprising a plurality of air-filled trenches (345) defining at least one pillar (340) of the dielectric material (400), at least said air-filled trenches (345) being capped by a porous capping layer (440). The interconnect layer (140), which typically is one of the uppermost interconnect layers of the IC, has an improved resilience to pressure exerted on the bond pad (160). The present invention further teaches a method for manufacturing such an IC.