Invention Grant
- Patent Title: Photosensitive resin composition and uses thereof
- Patent Title (中): 感光树脂组合物及其用途
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Application No.: US13780362Application Date: 2013-02-28
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Publication No.: US08722755B2Publication Date: 2014-05-13
- Inventor: Yu-Jie Tsai , Ming-Ju Wu
- Applicant: Chi Mei Corporation
- Applicant Address: TW Tainan City
- Assignee: Chi Mei Corporation
- Current Assignee: Chi Mei Corporation
- Current Assignee Address: TW Tainan City
- Agency: WPAT, P.C.
- Agent Anthony King
- Priority: TW101108984A 20120316
- Main IPC: C08F2/50
- IPC: C08F2/50 ; C08F2/46 ; B29C71/04 ; A61L2/08 ; A61L24/00 ; C08G61/04
Abstract:
The invention relates to a photosensitive resin composition, and an overcoat and/or spacer for a liquid crystal display component formed thereby has good heat-resistant transmittance, good chemical resistance and good elastic recovery rate. The invention also provides a method for forming a thin film on a substrate, a thin film on a substrate and a liquid crystal display component.
Public/Granted literature
- US20130245150A1 PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF Public/Granted day:2013-09-19
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