Invention Grant
- Patent Title: Wiring substrate and method for manufacturing wiring substrate
- Patent Title (中): 布线基板及其制造方法
-
Application No.: US13479833Application Date: 2012-05-24
-
Publication No.: US08723051B2Publication Date: 2014-05-13
- Inventor: Rie Arai
- Applicant: Rie Arai
- Applicant Address: JP Nagano
- Assignee: Shinko Electric Industries Co., Ltd.
- Current Assignee: Shinko Electric Industries Co., Ltd.
- Current Assignee Address: JP Nagano
- Agency: IPUSA, PLLC
- Priority: JP2011-125329 20110603
- Main IPC: H05K1/11
- IPC: H05K1/11

Abstract:
A wiring substrate includes a substrate body formed of an inorganic material and including a first surface and a second surface, a first trench formed in a first surface side of the substrate body, a second trench formed in a second surface side of the substrate body, a penetration hole penetrating through the substrate body, a first plane layer filling the first trench, a second plane layer filling the second trench, and a penetration wiring filling the penetration hole. The first plane layer is a reference potential layer. The second plane layer is a power supply layer.
Public/Granted literature
- US20120307470A1 WIRING SUBSTRATE AND METHOD FOR MANUFACTURING WIRING SUBSTRATE Public/Granted day:2012-12-06
Information query